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Название: Effect of ion implantation on the oxygen overpotential of Ni anodes
Авторы: Akano, U.
Davies, J. A.
Smeltzer, W. W.
Tashlykov, I. S.
Thompson, D. A.
Ключевые слова: БГПУ
ion implantation
nickel anode
Дата публикации: 1981
Издатель: North-Holland Publishing Company
Серия/номер: Nuclear Instruments and Methods;182–183, p. 985–990
Краткий осмотр (реферат): This work investigates the use of ion implantation for decreasing the oxygen-overpotential of nickel anodes. It is part of a search for improved electrocatalysts to increase the energy efficiency of the H2O electrolysis process for producing H2 gas. A series of Ni electrodes were implanted at room temperature with various doses of 50 keV Ag+, Li+, He+, or Kr+ ions. Polarization measurements were then made in a suitable electrolysis cell over a wide range of current densities, using aqueous KOH solution (30%) at 80 °C as electrolyte. In the case of Ag+ implants, Rutherford backscattering (RBS) measurements were performed before and after electrolysis in order to monitor the amount and depth distribution of the Ag atoms. For Li+ or He+ implantation, we observe a negligible change in the measured polarization curves. For high dose Kr+ implants (I0^18 ions cm^(-2)) the Ni electrode exhibits an increase in overpotential, indicating that excessive damage and/or sputtering of the surface causes some deterioration in electrode behaviour. For Ag+ implants, on the other hand, we observe a large (20–40%) reduction in the total overpotential at implant doses of 0.3–4*10^16 Ag+ cm^(-2). Furthermore, RBS measurements show that prolonged electrolysis at higher current density (24–28 h at 1A/cm^(-2)) produces only a small loss of Ag and shifts its depth profile to significantly larger depths. Supplementary nuclear microanalyses, using the 16O(d, p )17O reaction, show that the shift in Ag profile is correlated with the growth of an anodic nickel oxide (+carbon) layer during electrolysis. In one set of runs, the Ni electrodes were thermally oxidized before Ag+ implantation in order to form an 400 Å layer of NiO at the surface. In this case, we observe a somewhat smaller reduction in overpotential following Ag+ implantation; furthermore, a large loss of Ag into the electrolyte occurs during the subsequent electrolysis.
URI (Унифицированный идентификатор ресурса): http://elib.bspu.by/handle/doc/9224
Располагается в коллекциях:Научные публикации физико-математического факультета

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