Composition of Co films/Si substrate systems prepared by means of self-ion assisted deposition and accompanying silicon damage
| dc.contributor.author | Tashlykov, I. S. | |
| dc.contributor.author | Zhukowski, Pawel | |
| dc.contributor.author | Mikhalkovich, Oleg | |
| dc.contributor.author | Ermakov, Yuri | |
| dc.contributor.author | Chernysh, Vladimir | |
| dc.date.accessioned | 2018-02-23T07:16:51Z | |
| dc.date.available | 2018-02-23T07:16:51Z | |
| dc.date.issued | 2010 | |
| dc.description.abstract | Composition of Co films/Si substrate systems prepared by means of self-ion assisted deposition and accompanying silicon damage. | ru_RU |
| dc.identifier.uri | http://elib.bspu.by/handle/doc/31086 | |
| dc.language.iso | en | ru_RU |
| dc.relation.ispartofseries | Przegląd elektrotechniczny (Electrical Review);r. 86, nr 7, pp. 122–124 | |
| dc.subject | БГПУ | ru_RU |
| dc.subject | Co/Si structures | ru_RU |
| dc.subject | composition | ru_RU |
| dc.subject | damage | ru_RU |
| dc.subject | topography | ru_RU |
| dc.title | Composition of Co films/Si substrate systems prepared by means of self-ion assisted deposition and accompanying silicon damage | ru_RU |
| dc.type | Article | ru_RU |